http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021169630-A

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filingDate 2021-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cac3848a12aa075b091b3eb4e76b1864
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publicationDate 2021-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021169630-A
titleOfInvention Polycarbonate-polydiorganosiloxane copolymer, its resin composition, and its production method
abstract PROBLEM TO BE SOLVED: To provide a polycarbonate-polydiorganosiloxane copolymer or a resin composition thereof having both excellent impact resistance, particularly impact resistance at an extremely low temperature and chemical resistance, and a method for producing the same. Is to provide. A copolymer or a resin composition thereof of the present invention is the copolymer or a resin composition thereof containing a polycarbonate-polydiorganosiloxane copolymer and an optional polycarbonate resin. The copolymer comprises (A-1) polycarbonate block and (A-2) polydiorganosiloxane block. The (A-2) polydiorganosiloxane block is contained in the copolymer or its resin composition in an amount of 2.5 to 8.0% by weight, and the following (i) and (ii) are contained. The copolymer or resin composition thereof to be satisfied: (I) In a cross-sectional observation image of the copolymer or its resin composition using an electron beam microscope, 1 to 20 domains having a maximum major axis of 80 nm or more are present in a region of 850 nm square (722,500 nm 2). And (ii) the average domain size is 30-100 nm. [Selection diagram] None
priorityDate 2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006523243-A
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