| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F265-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2020-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_877db148a3a10b67081d6e425ffdade1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_615d744a1afca98a965d6f2d9eee182c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bc52415cb71261a284e32dad04bfe90 |
| publicationDate |
2021-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2021167905-A |
| titleOfInvention |
Photosensitivity composition, method for producing patterned cured film, and patterned cured film |
| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive composition having a low dielectric constant and capable of forming a well-patterned cured product, a cured product of the photosensitive composition, and a method for producing a cured product using the photosensitive composition. matter. SOLUTION: In a photosensitive composition containing an alkali-soluble resin (A), a photopolymerizable compound (B), and a photopolymerization initiator (C), 3 or 4 as the photopolymerizable compound (B). A polyfunctional compound having a (meth) acryloyl group and an oxime ester compound having a specific structure as a photopolymerization initiator (C) are used. [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023176335-A1 |
| priorityDate |
2020-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |