http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021155813-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B32-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B32-963
filingDate 2020-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27cbf3d5a38717b3d4875caa2420f4ca
publicationDate 2021-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021155813-A
titleOfInvention Manufacturing method for film-forming support substrate and polycrystalline substrate
abstract PROBLEM TO BE SOLVED: To easily separate a laminate of a desired size from a laminate of a support substrate and a film formed by a chemical vapor deposition method, shorten the time required for separation, improve production efficiency, and separate. Provided are a support substrate for film formation, which can suppress wear of the tool and reduce the cost by extending the life of the separation tool, and a method for manufacturing a polycrystalline substrate using the support substrate. SOLUTION: The film formation target surface to be a film formation target is provided by a chemical vapor vapor deposition method, and the film formation target surface is formed on a film formation target portion separated after film formation and an outer shape of the film formation target portion. It has a slit that is intermittently provided along the film and penetrates in the thickness direction of the film-forming support substrate, and a connecting portion located between the slits, and the length dimension of the connecting portion is from 1 mm to 1. It is 10 mm. [Selection diagram] Fig. 1
priorityDate 2020-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 30.