| abstract |
PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having good line edge roughness (LER). A resist composition containing a compound represented by the formula (I), a resin having a first acid unstable group, and an acid generator, wherein the resin has a first acid unstable group. , A resist composition containing at least one selected from the group consisting of the structural unit represented by the formula (a1-1) and the structural unit represented by the formula (a1-2). [In the formula, R 1 represents a halogen atom or an alkyl fluoride group. m1 represents an integer of 1-5. R 2 represents a di-acid unstable group. ] [Selection diagram] None |