http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021137930-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24C1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24C3-32
filingDate 2020-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20d6b1f4d3dfb06063b69cf87536198a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66332eb7517134280f6dfd822092427a
publicationDate 2021-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021137930-A
titleOfInvention Sandblasting method
abstract PROBLEM TO BE SOLVED: To achieve accurate patterning even when double-sided exposure is performed when a pattern is formed on a photosensitive resin layer provided on both front and back surfaces of a material to be sandblasted, which is a light-transmitting material, by photolithography. It is an object of the present invention to provide a sandblasting method capable of forming a good relief by sandblasting. SOLUTION: A step of providing a non-photosensitive resin film containing carbon black having a transmission concentration of 0.5 D or more and a thickness of 1 μm or more on at least one surface of a sandblasted material which is a light transmitting material. Sandblasting including a step of providing a photosensitive resin layer on both the front and back surfaces of a material to be sandblasted provided with a photosensitive resin film, a step of forming a pattern on the photosensitive resin layer by photolithography, and a step of performing a sandblasting treatment on the material to be sandblasted. Method. [Selection diagram] Fig. 2
priorityDate 2020-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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