http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021130200-A

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filingDate 2018-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8d2dd2395f09c2b533e4273ce3bb915
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13c97335e25169f32a1b486bef1df8e7
publicationDate 2021-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021130200-A
titleOfInvention Stereolithography composition set, stereolithography product, and method for manufacturing stereolithography products
abstract PROBLEM TO BE SOLVED: To provide a composition set for stereolithography capable of forming a stereolithographic object having elongation and strength such as rubber with high accuracy. SOLUTION: A plurality of kinds of monomers having an ethylene polymerizable group have a first monofunctional monomer having one ethylene polymerizable group and further having an amide group and one ethylene polymerizable group, and have a glass transition. The temperature (Tg) is the glass transition temperature (Tg) of a polymer obtained by polymerizing a plurality of types of monomers having an ethylene polymerizable group, which is obtained by the formula of FOX and contains a second monofunctional monomer having a temperature of 10 ° C. or lower. Is a composition for a model material having a temperature of 0 ° C. or higher, a water-soluble monofunctional ethylenically unsaturated monomer having a weight of 19 to 80 parts by weight or less, and an oxybutylene having a weight average molecular weight of 15 to 75 parts by weight or less having a weight average molecular weight of 300 or more. A composition for a support material containing a polyalkylene glycol containing a group, and a composition for photomodeling containing the composition. [Selection diagram] None
priorityDate 2018-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 25.