http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021124568-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F265-06 |
filingDate | 2020-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66332eb7517134280f6dfd822092427a |
publicationDate | 2021-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2021124568-A |
titleOfInvention | Photosensitive resin laminate and resist pattern formation method |
abstract | PROBLEM TO BE SOLVED: To laminate a photosensitive resin which can cope with miniaturization of a pattern, facilitate resist peeling even in a resist pattern having a narrow pitch, and stably hold a resist pattern having fine lines and dots on a substrate. A body and resist pattern forming method are provided. SOLUTION: At least (A) support film, (B) release layer and (C) photosensitive resin layer are laminated in this order, and (B) release layer has a saponification degree of 86.0 mol% or less and A photosensitive resin containing polyvinyl alcohol having a degree of polymerization of 900 or less, and the (C) photosensitive resin layer containing (C1) an alkali-soluble resin, (C2) a photopolymerization initiator, and (C3) an acrylate monomer. A method for forming a resist pattern using a photosensitive resin laminate and the photosensitive resin laminate, which is a composition and comprises (C3) an ethylene oxide-modified pentaerythritol tetraacrylate as an acrylate monomer. [Selection diagram] Fig. 1 |
priorityDate | 2020-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 177.