http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021119041-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2002-1742 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2002-16558 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2002-1655 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16552 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16535 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16526 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16508 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-17509 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-165 |
filingDate | 2020-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6d731ffcdeb4ec701cea09d8959773c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9686aa24e2dd4d63650bf65f3190333a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50d6cb3f617e75ab99db802a47f1e996 |
publicationDate | 2021-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2021119041-A |
titleOfInvention | Liquid injection device, maintenance method of liquid injection device |
abstract | PROBLEM TO BE SOLVED: To provide a liquid injection device and a maintenance method of a liquid injection device capable of reducing a possibility that a liquid injection state from a nozzle after a wiping operation becomes unstable. SOLUTION: In a liquid injection device, a liquid injection unit 20 capable of injecting a liquid from a nozzle 36 arranged on a nozzle surface and a band-shaped member 60 capable of absorbing the liquid injected by the liquid injection unit 20 are brought into contact with the nozzle surface. The control unit includes a wiping mechanism 43 capable of performing a wiping operation for wiping the nozzle surface, a wiping liquid supply mechanism 80 capable of supplying the wiping liquid to the strip-shaped member 60 before performing the wiping operation, and a control unit. When wiping the nozzle surface with a large amount of liquid adhering, the amount of wiping liquid held by the contact region A2 of the band-shaped member 60 in contact with the nozzle surface in the wiping operation is used when wiping the nozzle surface with a small amount of liquid adhering. Less. [Selection diagram] Fig. 3 |
priorityDate | 2020-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 166.