http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021104547-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad71e762e2ba75d45ab8bf6398c75a2e |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
filingDate | 2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d6b47a2f95e5711863c099ac96d0669 |
publicationDate | 2021-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2021104547-A |
titleOfInvention | Polishing slurry |
abstract | PROBLEM TO BE SOLVED: To provide a polishing slurry capable of increasing a polishing rate and polishing an aluminum nitride polycrystalline substrate so as to have a small surface roughness. The present invention is a polishing slurry used for polishing an aluminum nitride polycrystalline substrate, containing alumina abrasive grains and an anionic surfactant, and having a pH of 10 or more. [Selection diagram] None |
priorityDate | 2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 128.