http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021096466-A

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filingDate 2020-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36
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publicationDate 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021096466-A
titleOfInvention Method for manufacturing resist composition and resist pattern
abstract PROBLEM TO BE SOLVED: To provide a resist composition for forming a resist pattern having good CD uniformity (CDU). A resist composition containing a compound represented by the formula (I), a resin having an acid unstable group, and an acid generator. [In the formula, R 1 represents a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, and −CH 2 − contained in the hydrocarbon group is −O−, −S−, −. It may be replaced with CO- or -SO 2-. R 2 and R 3 each independently represent a saturated hydrocarbon group having 1 to 6 carbon atoms. X a and X b each independently represent an oxygen atom or a sulfur atom. X 11 represents a saturated hydrocarbon group having 1 to 12 divalent carbon atoms which may have a fluorine atom. L 1 represents a hydrocarbon group having 1 to 28 carbon atoms which may have a single bond or a substituent, and −CH 2 − contained in the hydrocarbon group is −O−, −S−, −SO. It may be replaced with 2- or -CO-. ] [Selection diagram] None
priorityDate 2019-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.