http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021096466-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D321-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00 |
filingDate | 2020-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04d3730b6ad527289e0c18d5b14850d2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563 |
publicationDate | 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2021096466-A |
titleOfInvention | Method for manufacturing resist composition and resist pattern |
abstract | PROBLEM TO BE SOLVED: To provide a resist composition for forming a resist pattern having good CD uniformity (CDU). A resist composition containing a compound represented by the formula (I), a resin having an acid unstable group, and an acid generator. [In the formula, R 1 represents a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, and −CH 2 − contained in the hydrocarbon group is −O−, −S−, −. It may be replaced with CO- or -SO 2-. R 2 and R 3 each independently represent a saturated hydrocarbon group having 1 to 6 carbon atoms. X a and X b each independently represent an oxygen atom or a sulfur atom. X 11 represents a saturated hydrocarbon group having 1 to 12 divalent carbon atoms which may have a fluorine atom. L 1 represents a hydrocarbon group having 1 to 28 carbon atoms which may have a single bond or a substituent, and −CH 2 − contained in the hydrocarbon group is −O−, −S−, −SO. It may be replaced with 2- or -CO-. ] [Selection diagram] None |
priorityDate | 2019-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.