http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021096464-A

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filingDate 2020-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5756d88bd4de1b02e40fcc310564b566
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publicationDate 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021096464-A
titleOfInvention Method for producing resist composition and resist pattern, and carboxylic acid salt and carboxylic acid generator
abstract PROBLEM TO BE SOLVED: To provide a resist composition, a carboxylic acid salt and a carboxylic acid generator capable of producing a resist pattern having good CD uniformity (CDU). A resist composition containing a carboxylic acid salt represented by (IA) or (IB). R 1 , R 2 , R 6 and R 7 represent hydrocarbon groups which may have substituents, respectively, and -CH 2 − contained in the hydrocarbon group is -O-, -S-,-. It may be replaced by CO- or -SO 2- , and R 1 and R 2 , R 6 and R 7 may be combined with each other to form a ring. R 3 represents a halogen atom or an alkyl fluoride group. R 4 and R 5 represent a halogen atom, a hydroxy group, an alkyl group and the like. [Selection diagram] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023068251-A1
priorityDate 2019-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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