http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021089347-A

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filingDate 2019-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2021-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021089347-A
titleOfInvention Photosensitive resin composition, photosensitive resin film, photosensitive dry film, pattern forming method and light emitting element
abstract PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of easily forming a film having good heat resistance, lithography resolution and light emitting characteristics, a photosensitive resin film obtained by using the photosensitive resin composition, a photosensitive dry film and the like. Provided are a pattern forming method using these, and a light emitting element obtained by using the photosensitive resin composition. A photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) quantum dot particles. [Selection diagram] None
priorityDate 2019-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 34.