abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of easily forming a film having good heat resistance, lithography resolution and light emitting characteristics, a photosensitive resin film obtained by using the photosensitive resin composition, a photosensitive dry film and the like. Provided are a pattern forming method using these, and a light emitting element obtained by using the photosensitive resin composition. A photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) quantum dot particles. [Selection diagram] None |