http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021081617-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73e224665ceb7b15f8e66dfd0ee245c6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2019-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb750dee249618ea7d00e7f945a427e1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ae1895af798be19754e616f59e7163c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79bfd2834d541b014521ff41bdfb1a05 |
| publicationDate | 2021-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2021081617-A |
| titleOfInvention | Resist stripper |
| abstract | PROBLEM TO BE SOLVED: To provide a resist stripping solution in which undercut of copper or molybdenum is suppressed when stripping a hard-baked resist on a copper / molybdenum laminated film. SOLUTION: A secondary cyclic amine of 0.5 to 5% by mass with respect to the total amount of the stripping solution, 5 to 10% by mass of basic amino acids with respect to the secondary cyclic amine, With 10 to 30% by mass of the protective agent with respect to the basic amino acid, With respect to the secondary cyclic amine, 10 to 50% by mass of sugar alcohol and With organic polar solvents A resist stripping solution characterized by containing water. [Selection diagram] None |
| priorityDate | 2019-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 58.