| abstract |
PROBLEM TO BE SOLVED: To provide a positive resist material having higher sensitivity and higher resolution than conventional positive resist materials, having small edge roughness and dimensional variation, and having a good pattern shape after exposure, and a pattern forming method. SOLUTION: A repeating unit a having an imide group to which an aromatic group substituted with an iodine atom is bonded, a repeating unit b1 in which a hydrogen atom of a carboxy group is substituted with an acid unstable group, and a phenolic hydroxy group. A positive resist material comprising a base polymer comprising at least one selected from the repeating unit b2 in which the hydrogen atom is substituted with an acid unstable group. [Selection diagram] None |