http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021048351-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-64
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filingDate 2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b3622a683312ca8709cebb7b8178eb8
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publicationDate 2021-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021048351-A
titleOfInvention Inspection method and inspection equipment
abstract PROBLEM TO BE SOLVED: To provide a technique capable of detecting an electromagnetic wave by reducing an offset. An object that is a semiconductor device is inspected. The inspection method consists of an irradiation step in which the optical modulator modulates the pulsed light emitted from the light source with a variable modulation frequency and irradiates the object with the modulated pulsed light, and the detector uses an electromagnetic wave pulse from the object. A detection process that outputs an electric signal based on the intensity of the electromagnetic pulse, and the lock-in amplifier extracts a detection signal indicating the intensity of the electromagnetic wave pulse from the electric signal based on the reference signal according to the modulation frequency, and the intensity of the electromagnetic wave pulse. It includes a setting step of resetting at least one of the modulation frequency and the phase of the reference signal so that the offset amount is within the specified range including zero. [Selection diagram] FIG. 7
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102535830-B1
priorityDate 2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
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Total number of triples: 18.