abstract |
PROBLEM TO BE SOLVED: To provide a negative photosensitive composition having excellent chemical resistance and capable of low temperature curing. A negative type comprising (I) a polysiloxane having a specific structure, (II) a polymerization initiator, (III) a compound containing two or more (meth) acryloyloxy groups, and (IV) a solvent. Photosensitive composition. [Selection diagram] None |