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filingDate 2020-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_729795669b4217195adeb045e0afa87a
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publicationDate 2021-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021002679-A
titleOfInvention Semiconductor device
abstract PROBLEM TO BE SOLVED: To obtain high reliability by increasing the dielectric strength of a gate insulating film. SOLUTION: An oxide semiconductor film on an insulating surface, a pair of first conductive films on an oxide semiconductor film, and the like. The oxide semiconductor film, the first insulating film to the third insulating film laminated on the pair of the first conductive films in order, and the second conductive film overlapping the oxide semiconductor film on the first insulating film to the third insulating film. With the film The first insulating film and the third insulating film include silicon oxide, silicon nitride, silicon oxide nitride, silicon nitride oxide, aluminum oxide, or aluminum nitride, and the second insulating film includes gallium oxide and zirconium oxide. , Or a semiconductor device containing hafnium oxide. [Selection diagram] Fig. 1
priorityDate 2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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