| abstract |
A negative-working photoresist composition imageable by radiation at 365 nm that is developable in aqueous base. Excluding the solvent, this composition has a) a polymer binder resin having a ring-bonded hydroxyl group, which is soluble in a base and soluble in a phenolic film; b) a photoacid generator; c) a crosslinker containing an etherified melamine; A dye as described herein; e) a quencher system consisting essentially of an amine quencher or mixture of such amine quenchers, as described. The invention also relates to the process of using this composition as a photoresist. |