http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020513433-A
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M1-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B42D25-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-12 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B42D25-378 |
filingDate | 2017-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2020513433-A |
titleOfInvention | Low energy curable offset and letterpress inks and printing processes |
abstract | The present invention relates to the field of low energy radical curable inks for offset or letterpress printing of security documents. In particular, the present invention is a low energy radical curable offset or letterpress ink for offset or letterpress printing on substrates or security documents in the range of about 2.5 to about 25 Pa · s at 40 ° C. and 1000 s −1. Radically curable (meth) acrylate compound, one or more photoinitiators of formula (I), one or more machine-readable materials, and one or more fillers and / or extenders Energy radical curable offset or letterpress inks containing an agent. [Selection diagram] None |
priorityDate | 2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 257.