| abstract |
The present disclosure relates to a method of depositing a polymer layer, comprising providing a substrate having a sensor structure disposed thereon to a substrate support inside a hot wire chemical vapor deposition (HWCVD) chamber. Supplying a processing gas, including an initiator gas, a monomer gas, and a carrier gas, to the HWCVD chamber and activating the plurality of filaments disposed within the HWCVD chamber to activate the initiator gas without decomposing the monomer gas. Heating to a sufficient first temperature and exposing the substrate to initiator radicals from the activated initiator gas and monomer gas to deposit a polymer layer on the sensor structure. [Selection diagram] Fig. 1 |