abstract |
PROBLEM TO BE SOLVED: To provide a resist underlayer composition and a pattern forming method using the composition. SOLUTION: The polymer has a polymer main chain, a polymer having a substituted or unsubstituted fullerene group bonded to the polymer main chain in a pendant shape, and a resist underlayer composition of 50 to 99.9% by weight based on the total. A resist underlayer composition containing an amount of solvent. [Selection diagram] None |