| abstract |
PROBLEM TO BE SOLVED: To provide a resist underlayer composition and a pattern forming method using the composition. SOLUTION: The resist underlayer composition contains a polyarylene ether, an additive polymer different from the polyarylene ether, and a solvent, and the additive polymer is at least selected from hydroxy, thiol, and amino. A resist underlayer composition comprising an aromatic or heteroaromatic group having one protected or free functional group. [Selection diagram] None |