| abstract |
PROBLEM TO BE SOLVED: To obtain a cured film having sufficient lithography performance and having sufficient etching chemical solution resistance and oxygen ashing resistance even by heating at a relatively low temperature (for example, 120 ° C. or lower), radiation-sensitive composition, radiation-sensitive. An insulating film for a display device and a display device obtained by using a sex composition, a method for forming an insulating film for a display device using a radiation-sensitive composition, and silsesquioxane suitable as a component of the radiation-sensitive composition. provide. SOLUTION: A silsesquioxane having a first structural unit represented by the formula (1) and a second structural unit represented by the formula (2), a radiation-sensitive radical polymerization initiator, and an organic solvent. It is a radiation-sensitive composition containing. In formula (1), X is a monovalent organic group having an unsaturated double bond. [Selection diagram] Fig. 1 |