http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020173437-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate | 2020-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5756d88bd4de1b02e40fcc310564b566 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0106502b1821cd02a499d92f680621ab |
publicationDate | 2020-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2020173437-A |
titleOfInvention | Method for manufacturing resist composition and resist pattern |
abstract | PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having CD uniformity. A resist composition containing a structural unit represented by the formula (a2-A) and a resin containing a structural unit having an acid unstable group, and a salt represented by the formula (I). [In formula (I), Q 1 and Q 2 are fluorine atoms or perfluoroalkyl groups, respectively; X 1 is * -CO-O-, * -O-CO-, etc .; L 1 is a single bond or divalent. Saturated hydrocarbon group; R 3 is a naphthyl group which may have a substituent; Z + represents an organic cation. ] [Selection diagram] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7226095-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020193151-A |
priorityDate | 2019-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 214.