| abstract |
PROBLEM TO BE SOLVED: To provide a negative resist composition capable of reducing LWR and CDU of a pattern and forming a good shape with high sensitivity, and a resist pattern forming method using the composition. SOLUTION: A sulfonium salt of a carboxylic acid anion in which a phenyl group having a substituent at the terminal is linked by an ester bond, a base polymer having an acrylic structural unit having an aromatic ring at the end of a resin side chain, and a photoacid for generating an acid. A chemically amplified negative type resist composition, which comprises a generator. [Selection diagram] None |