| abstract |
PROBLEM TO BE SOLVED: To provide a novel polymer capable of reducing sublimation substances at the time of film formation and a composition containing the same. A polymer (A) according to the present invention has at least a structural unit selected from the group consisting of units (a), units (b), units (c), and units (d) having a specific structure. The following equation: n a , which includes one and is the number of repetitions of the units (a), (b), (c), and (d), respectively, n a , n b , n c , and n d. It satisfies + n b > 0, n c ≧ 0, and n d ≧ 0. [Selection diagram] None |