http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020126257-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate | 2020-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7feabab4404851399270b8110a2a8848 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb8e7c00a20f1d357fe250c094c8ca22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccc8f4b7a0bd0fb3eff76cd394416939 |
| publicationDate | 2020-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2020126257-A |
| titleOfInvention | Acid generator and photoresist containing the same |
| abstract | PROBLEM TO BE SOLVED: To provide a resist material which provides high resolution fine features, including sensitivity sufficient to provide low line width roughness and wafer throughput. SOLUTION: (i) a polymer; (ii) a first onium hydrochloric acid generator that generates a first acid when a photoresist composition is exposed to activating radiation; (iii) (1) a covalently bonded acid. A photoresist composition comprising a labile moiety; and (2) a second onium hydrochloride generator that produces a second acid when the photoresist composition is exposed to activating radiation. The acid and the second acid have pKa values that differ by at least 4.0, and the anion of the first onium hydrochloride generator or the second onium hydrochloride generator is an electron withdrawing group in the α-position to the carboxylic acid moiety. Is a carboxylate anion not containing and the acid labile moiety of the second onium chloride generator is a group of formula -C(=O)O(CH2)n(C=O)O-ALG. Stuff. [Selection diagram] None |
| priorityDate | 2012-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 156.