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filingDate 2019-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_473ec7dbaf937c3798f563773d0f33d1
publicationDate 2020-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2020113570-A
titleOfInvention Oxide semiconductor film, laminate, and method for manufacturing oxide semiconductor film
abstract 【Task】 An object is to provide an oxide semiconductor film containing gallium as a main component which is excellent in ohmic characteristics. [Solution] An oxide semiconductor film containing gallium as a main component, wherein the specular reflectance of the surface of the oxide semiconductor film is 15% or less under conditions of an incident light wavelength of 633 nm and an incident angle of 45°. [Selection diagram] Figure 1
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Total number of triples: 33.