abstract |
PROBLEM TO BE SOLVED: To provide a pattern forming method which is less likely to cause variation in thickness between production lots and can be suitably applied to gray scale exposure, and an actinic ray-sensitive or radiation-sensitive resin composition. A step A of forming a film having a thickness T on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin whose solubility in a developing solution is changed by the action of an acid and an acid generator. And a step B of exposing the film, and a step C of developing the exposed film with a developing solution to form a pattern, wherein the film formed in the step A is A pattern forming method satisfying at least one of the following Condition 1 and Condition 2. Condition 1: When the film thickness T is 800 nm or more, the value of γ is less than 10,000. Condition 2: When the film thickness T is less than 800 nm, the value of γ is less than 5000. [Selection diagram] Figure 2 |