| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0214
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45574
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 |
| filingDate |
2018-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a95ac91a65b361e636dd862ec4b2a36d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28aeaa34bc28ff5dc6f9841cbc47e151
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6174edd6bd3d9573eef76d1991cba45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1dd13e5da8e3bd2bb70e7dcf5be7cf64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dab5b20e9ce8a6d25e32571a1c652955
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53eda6d3da78c38aa541fcf984877edd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e742c628e1f55b0f3386d4065311250 |
| publicationDate |
2020-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2020096089-A |
| titleOfInvention |
Semiconductor device manufacturing method, surface treatment method, substrate treatment apparatus, and program |
| abstract |
PROBLEM TO BE SOLVED: To improve the quality of substrate processing performed in a processing container. SOLUTION: (a) A step of supplying a source gas to a substrate in a processing container from a metal first pipe and a first nozzle, and a step of supplying a metal second to a substrate in the processing container. A cycle including a step of supplying an oxygen-containing gas from the pipe and the second nozzle and a step of supplying a nitrogen- and hydrogen-containing gas to the substrate in the processing container from the second pipe and the second nozzle is predetermined. By performing the process a number of times, the step of forming a film on the substrate and (b) supplying the fluorine-containing gas into the second pipe chemically reacts the fluorine-containing gas with the inner surface of the second pipe. And a step of forming a continuous fluorine-containing layer on the inner surface of the second pipe. [Selection diagram] Figure 4 |
| priorityDate |
2018-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |