abstract |
PROBLEM TO BE SOLVED: To provide a resist composition having good lithographic properties, a method for forming a resist pattern using the resist composition, and a novel compound for the resist composition. A base component (A) whose solubility in a developing solution is changed by the action of an acid and a compound (D0) represented by the general formula (d0), which is composed of an anion part and a cation part, are contained. A resist composition having a LogP value of the cation portion of the compound (D0) of less than 7.7. In the formula, M m+ represents an m-valent organic cation. R d0 is a substituent. p is an integer of 0-3. q is an integer of 0 to 3. n is an integer of 2 or more. However, n+p≦(q×2)+5. [Chemical 1] [Selection diagram] None |