abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having good reliability (adhesion and crack resistance), flexibility, lithographic resolution and light resistance while having a sufficient function as an antireflection film, and the photosensitive material. Provided are a pattern forming method using a photosensitive resin composition and a cured film having an antireflection function obtained by using the photosensitive resin composition. A photosensitive resin composition containing (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) hollow silica. [Selection diagram] None |