http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020077693-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2018-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecb4fd6701b937929e26c0cb4a47ba2f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66332eb7517134280f6dfd822092427a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_795e623010ec4824a88596b6a27b40bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6c4ca6f8a1cee642ff730d5951140e |
| publicationDate | 2020-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2020077693-A |
| titleOfInvention | Etching method |
| abstract | PROBLEM TO BE SOLVED: To provide an etching method for etching a base material such as a polyimide film with a strong alkaline etching solution by using a resist pattern formed from an alkali developing type and a negative type photosensitive resin composition layer. An object of the present invention is to provide an etching method capable of suppressing dissolution, swelling or peeling of a resist pattern before etching is completed. SOLUTION: (Step 1) a step of forming an alkali-developable and negative photosensitive resin composition layer on at least one surface of a substrate, and (Step 2) exposing and developing the photosensitive resin composition layer to form a resist. A step of forming a pattern, (step 3) a step of additionally exposing the resist pattern, (step 4) a base by an etching solution containing 15 to 45% by mass of an alkali metal hydroxide and 5 to 40% by mass of an ethanolamine compound. An etching method comprising a step of etching a material, wherein the time from the end of (step 3) to the start of (step 4) is 30 minutes or less. [Selection diagram] None |
| priorityDate | 2018-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 157.