| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-10061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2817
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-30483 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9503
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-147
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T5-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67288 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-2251
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-22 |
| filingDate |
2018-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73134a5c09ff5eda4d66abd059f7261e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85d06245402b7e246f476eba3a93ca2b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a469c95937b1a6ccd56f09e89f0b6f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_080521ffadb5c919de1d262bd9cd2f33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e555cdbe766c58302f30ed8249985a75 |
| publicationDate |
2020-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2020043266-A |
| titleOfInvention |
Semiconductor wafer defect observation system and defect observation method |
| abstract |
【Task】 A device for observing a semiconductor wafer. When an image of the outer periphery of the wafer is taken, the positional relationship between the in-wafer region and the background region in the image field of view is not constant, and the amount of computation in the defect detection and image classification processing is increased and robust. This makes it difficult to efficiently observe and analyze defects. [Solution] What is claimed is: 1. A semiconductor wafer defect observation system, comprising: a stage movable in XY directions for mounting a semiconductor wafer; an imaging unit for imaging a part including an edge of the semiconductor wafer; An image output unit for outputting an image in which the edge of the wafer is substantially parallel to the plurality of images in the plurality of images is provided. [Selection diagram] FIG. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022070498-A1 |
| priorityDate |
2018-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |