http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020041099-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00
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filingDate 2018-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_795e623010ec4824a88596b6a27b40bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bab68a29c34e60142507c0a6de17474
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publicationDate 2020-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2020041099-A
titleOfInvention Etching equipment
abstract An object of the present invention is to provide an etching apparatus used for etching a resin composition containing an alkali-insoluble resin and an inorganic filler with an etchant, due to a precipitate of the resin composition in a dipping tank. It is another object of the present invention to provide an etching apparatus that can solve the problem that the dispersibility of the etchant becomes non-uniform when the etchant is circulated and the residue of the resin composition layer is generated. An etching apparatus has an etching unit for removing a resin composition with an etching solution, the etching unit being a dip tank containing an etching solution, in which an object to be processed having the resin composition is immersed. It has a storage tank for collecting the etchant overflowing from the dip tank, and a sediment collection pipe for sending the sediment collected on the bottom of the dip tank to the storage tank. An etching apparatus having a three-dimensional inclination, wherein an outlet of a sediment collection pipe is connected to a storage tank. [Selection diagram] FIG.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111696881-A
priorityDate 2018-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 45.