http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020006557-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2002-16558 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2002-1655 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16552 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16585 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16535 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-165 |
| filingDate | 2018-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50d6cb3f617e75ab99db802a47f1e996 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79edc4b193d5e44e0fa31ba76db89acc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc2f0a9bc15b9811b8c5c4e6734f97c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be291b46a6c17830649d5d94e3f91dbe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e3e59fa09285500380809c29740443e |
| publicationDate | 2020-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2020006557-A |
| titleOfInvention | Liquid ejecting apparatus and maintenance method for liquid ejecting apparatus |
| abstract | An object of the present invention is to provide a liquid ejecting apparatus and a maintenance method of the liquid ejecting apparatus, which can be appropriately wiped. The liquid ejecting apparatus includes a liquid ejecting unit that ejects a liquid from a nozzle, a wiping mechanism 833 that wipes a nozzle surface on which a plurality of nozzles are arranged by a wiping member 845 configured to absorb the liquid, and a wiping device. A wiping liquid supply mechanism 834 for supplying the liquid to the wiping member, and a relative movement mechanism 867 for relatively moving the liquid ejecting unit and the wiping member when wiping the nozzle surface with the wiping member, wherein the wiping member supplies the wiping liquid. The wet wiping for wiping the nozzle surface in the absorbed state is performed, and the supply amount of the wiping liquid when the nozzle surface is wiped by the wiping member can be changed. [Selection diagram] FIG. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020157590-A |
| priorityDate | 2018-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 226.