http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020003623-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D213-79 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D213-55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-3432 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2018-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_164dc69fc7a29d8ef9a68fac4f41772f |
| publicationDate | 2020-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2020003623-A |
| titleOfInvention | Chemically amplified positive photosensitive resin composition, photosensitive dry film, method for producing photosensitive dry film, method for producing patterned resist film, method for producing substrate with mold, method for producing plated molded article, and nitrogen-containing Aromatic heterocyclic compound |
| abstract | The present invention provides a chemically amplified positive photosensitive resin composition which is easy to form a resist pattern having a rectangular cross section, and a photosensitive dry film including a photosensitive resin layer comprising the chemically amplified positive photosensitive resin composition. A method for producing the photosensitive dry film, a method for producing a patterned resist film using the aforementioned chemically amplified positive photosensitive resin composition, and using the aforementioned chemically amplified positive photosensitive resin composition. A method for producing a substrate with a mold, a method for producing a plated product using the substrate with a template, and a novel nitrogen-containing aromatic heterocyclic compound. A chemically amplified positive photosensitive resin comprising: an acid generator (A) that generates an acid upon irradiation with actinic rays or radiation; and a resin (B) whose solubility in an alkali is increased by the action of an acid. The composition contains a nitrogen-containing aromatic heterocyclic compound (C) which is a nitrogen-containing aromatic heterocyclic compound having a specific structure and a LogS value of −6.00 or less. [Selection diagram] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112020006522-T5 |
| priorityDate | 2018-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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