http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019532184-A
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5846 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 |
filingDate | 2017-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2019-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2019532184-A |
titleOfInvention | Method for producing metal-containing film |
abstract | [Solution] The present invention relates to a method for producing an inorganic thin film on a substrate, and more particularly to the field of atomic layer deposition. That is, (a) a step of depositing a metal-containing compound from a gaseous state on a solid substrate, and (b) a solid substrate having the deposited metal-containing compound is represented by the following general formulas (Ia), (Ib) , (Ic), (Id), (IIa), (IIb), (IIc) or (IId) (In the formula, A represents O or NR N, R and R N represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a silyl group, R 1, R 2, R 3 and R 4 And represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a silyl group, or an ester group, and E represents no oxygen atom, a methylene group, an ethylene group, or a 1,3-propylene group. The manufacturing method of the metal containing film | membrane including the step made to contact with the compound represented by these. [Selection figure] None |
priorityDate | 2016-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 66.