http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019507373-A
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2017-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2019-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2019507373-A |
titleOfInvention | Surface treatment composition and resist pattern surface treatment method using the same |
abstract | An object of the present invention is to provide a composition for surface treatment excellent in coating property, which can improve the heat resistance of a resist pattern and reduce the solubility in a solvent. Also provided are a resist pattern surface treatment method using the surface treatment composition and a resist pattern formation method using the surface treatment composition. A solvent and a polysiloxane compound soluble in the solvent, wherein the silicon atom constituting the polysiloxane compound is bonded to a hydrocarbon group substituted with nitrogen, and the hydrocarbon group contains A composition for surface treatment of a resist pattern, wherein the atom directly bonded to the silicon atom is a carbon atom. Also, a surface treatment method using the composition and a resist pattern forming method. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021020091-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7342953-B2 |
priorityDate | 2016-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.