| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1828
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0445
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0296
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02966
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0629
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 |
| filingDate |
2017-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2019-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2019505685-A |
| titleOfInvention |
Method for depositing a CdTe film on a substrate |
| abstract |
The present invention is a method for depositing a CdTe film on a substrate (2) by physical vapor deposition in a vacuum chamber (1), wherein the substrate (2) is heated to a coating temperature before the deposition process, and then the substrate In the method of transporting (2) and passing the vicinity of at least one container (3) for transferring CdTe (4) to a vapor state, the substrate (2) is transported and the at least one container (3 The gaseous component having an increased pressure (relative to the vacuum in the vacuum chamber) passes through at least one inlet (5) of the substrate (2) to be coated. It relates to a method in which the gaseous component is adsorbed on the surface of the substrate (2) to be coated by flowing towards the surface. |
| priorityDate |
2016-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |