| abstract |
The present invention provides a resist composition and a resist pattern forming method using the resist composition, which can further reduce roughness and improve the rectangularity of the cross-sectional shape of the resist pattern. A resist composition comprising a compound (BD1) having an anion part and a cation part represented by the general formula (bd1) and an organic solvent (S1) having a hydroxyl group. In the formula (bd1), Rx 1 to Rx 4 may represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure. Ry 1 to Ry 2 may represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure. Rz 1 to Rz 4 represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure. At least one of Rx 1 to Rx 4 , Ry 1 to Ry 2 and Rz 1 to Rz 4 has an anionic group. M m + represents an organic cation. [Selection figure] None |