http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019199565-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_26f787ebd46623d19884567098dc66d0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2018-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d61604449b39950320d3a048e46604cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_028d95fb275cf2119d4dc6325a1e4330 |
| publicationDate | 2019-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2019199565-A |
| titleOfInvention | Resin for photoresist, method for producing resin for photoresist, and photoresist composition |
| abstract | Provided is a photoresist resin used in a photoresist composition having high sensitivity and resolution and having excellent dry etching resistance. The present invention includes a polycondensation product of a novolak resin containing orthocresol as a main component and a phenol compound having at least two methylol groups in the molecule. [Selection figure] None |
| priorityDate | 2018-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 83.