http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019178430-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
filingDate 2019-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d598eebfbbdb5e7130c53652fbf617e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eef87e74f3d125e77f8dffe133029ccc
publicationDate 2019-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2019178430-A
titleOfInvention Substrate processing apparatus, semiconductor device manufacturing method, and recording medium
abstract The present invention provides a technique for reducing the influence of the surface area per one large surface area substrate and the number of loaded substrates and achieving good film thickness uniformity between the substrate loading regions. A substrate support having a substrate loading area having a plurality of slots, wherein Y (Y <X) is loaded into a substrate support having a maximum number of substrates loaded of X (X ≧ 3). In addition, the substrates are distributed and loaded so that the maximum continuous loading number of substrates becomes Z (Z <Y), and (a) if 25 ≦ X ≦ 200, each slot and 10 slots adjacent to each slot, a total of 11 slots ( b) In 11 ≦ X ≦ 24, each slot and 4 adjacent slots in each slot are 5 slots in total, (c) In 5 ≦ X ≦ 10, in each slot and 2 slots adjacent to each slot, 3 slots in total By adjusting the value of Z so that each of the substrate density average value of the substrate density average value and the uniformity value between the substrate loading regions is smaller than the substrate density average value of the substrate density when Z = Y, the substrate is adjusted. Scatter loading Plate processing equipment. [Selection] Figure 6
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023012872-A1
priorityDate 2019-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.