http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019172902-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2018-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58f567d20ffa5c3115148e8f03296372 |
| publicationDate | 2019-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2019172902-A |
| titleOfInvention | Polishing composition and polishing method |
| abstract | As a polishing composition for polishing a substrate surface made of an oxide single crystal such as lithium tantalate or lithium niobate, the polishing rate is high, the surface quality of a polished object after polishing can be improved, and the time course Provided are those that have high stability and can suppress carrier noise during polishing. The polishing composition of the present invention contains colloidal silica, an amine compound having a hydroxyl group, and water, and the ratio of the amount of colloidal silica to the total amount of colloidal silica, amine compound, and water is 5% by mass. The ratio of the amount of the amine compound having a hydroxyl group to the total amount is 0.01% by mass or more and 5% by mass or less. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113444454-A |
| priorityDate | 2018-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 77.