http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019171236-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D175-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-20
filingDate 2018-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_310469d331440da7785bb27f971332bd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58bc62e8f7a1554c45aa50c944a38669
publicationDate 2019-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2019171236-A
titleOfInvention Film formation method
abstract An object of the present invention is to suppress defects caused by moisture such as condensation and to form a film having excellent finish. The present invention relates to a film forming method in which a coating material is applied to a substrate and dried to form a film, the coating material comprising a polyol compound, a polyisocyanate compound, and a nonaqueous solvent. Including, as the polyol compound, an acrylic polyol compound (a) having a weight average molecular weight of 50000 or less in a total solid content of the polyol compound of 20% by weight or more and an aliphatic hydrocarbon solvent as the non-aqueous solvent The drying of the covering material is performed at least through a state in a low temperature environment. [Selection figure] None
priorityDate 2018-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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