http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019167583-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bd0cdbc5c67cf4957ed83c89140748e |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-18 |
filingDate | 2018-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d031f99746bc0726204a4b39ef5938e |
publicationDate | 2019-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2019167583-A |
titleOfInvention | Copper-clad laminate and method for producing copper-clad laminate |
abstract | The present invention provides a copper clad laminate having a copper plating film in which recrystallization proceeds slowly, and a method for producing the copper clad laminate. A copper-clad laminate 1 includes a base material 10 and a copper plating film 20 formed on the surface of the base material 10. The copper plating film 20 is formed by alternately laminating a low current density layer 21 formed by electrolytic plating at a low current density and a high current density layer 22 formed by electrolytic plating at a high current density. The copper-clad laminate 1 is obtained by forming a copper plating film 20 on the surface of the base material 10 by electrolytic plating using a copper plating solution containing an additive. At this time, electrolytic plating at a low current density and electrolytic plating at a high current density are alternately performed to form a copper plating film 20. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020132920-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7211184-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7230564-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020132921-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7276025-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7322678-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020152955-A |
priorityDate | 2018-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.