http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019153616-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2018-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_296379c68f9f0134ce77033dfad5f6be |
| publicationDate | 2019-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2019153616-A |
| titleOfInvention | Imprint method and article manufacturing method |
| abstract | An imprint method is provided which is advantageous for suppressing pattern defects. An arrangement step of arranging a photocurable composition 11 on a substrate 12, a mold contact step of bringing the photocurable composition 11 and a mold 14 into contact, and irradiating the photocurable composition 11 with light. A cured product and a mold release step for separating the cured product and the mold 14, and the substrate 12 is a composition contained in the photocurable composition 11 before the placing step. And exposing to the pretreatment composition 10, which is a polymerizable compound, and depositing the pretreatment composition 10 on the substrate 12. [Selection] Figure 2 |
| priorityDate | 2018-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.