| abstract |
A resist material having high resolution, high sensitivity, a good pattern shape after exposure and low line edge roughness, and a pattern forming method using the resist material. As the component (A), a metal compound represented by the formula (A-1), a hydrolyzate of the metal compound represented by the formula (A-1), and a formula (A-1). Hydrolysis condensates of metal compounds, and at least one of a reaction product of these with a divalent or trivalent alcohol represented by the formula (A-2), and as the component (B), the formula (B-1) And a sensitizer containing a compound represented by the formula: wherein the solubility in a developing solution is changed by exposure to high energy rays. [Selection figure] None |