| abstract |
A novel Te salt compound containing a photoactive tellurium salt compound useful for extreme ultraviolet lithography is provided. A salt of the following formula (I): Wherein R1 to R3 are each independently a substituted / unsubstituted C6-60 aryl group, C6-20 fluoroaryl group, C1-20 heteroaryl group, C7-20 aralkyl group, C7-20 fluoroaralkyl group. , C2-20 heteroaralkyl group, or C2-20 fluoroheteroaralkyl group C1-20 alkyl group, C1-20 fluoroalkyl group, C3-20 cycloalkyl group, C3-20 fluorocycloalkyl group, C2-20 alkenyl group C2-20 fluoroalkenyl group; R1 is separate or connected to R2 and / or R3 to form a ring; Z includes a counter anion) |