| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2800-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-102 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 |
| filingDate |
2019-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d1a9f53b3909fe4bff7091e85364e5e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e2cf846501de5191624a40418c03b36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47a111168c8b618bd6b9b78cceed8289
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5dd807c2e9f1e5f12b36ed57b82419d5 |
| publicationDate |
2019-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2019096898-A |
| titleOfInvention |
Curable composition for imprint, cured product, pattern forming method, lithography method, pattern and mask for lithography |
| abstract |
PROBLEM TO BE SOLVED: To provide a curable composition for imprints capable of achieving both improvement of releasability and suppression of generation of waviness at the time of etching, and a cured product, pattern using the above-mentioned curable composition for imprints Provision of formation method, lithography method, pattern and mask for lithography. A monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure and an aromatic ring structure and having a viscosity at 25 ° C. of 150 mPa · s or less, and an imprint containing a photopolymerization initiator A curable composition for an imprint, wherein the monofunctional polymerizable compound is contained in an amount of 5 to 30% by mass based on all the polymerizable compounds in the curable composition for imprints A curable composition for imprints, wherein the cured film has a modulus of 3.5 GPa or less and a glass transition temperature of 90 ° C. or more. 【Selection chart】 None |
| priorityDate |
2015-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |